Surface roughening of copper by low energy ion bombardment-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Surface roughening of copper by low energy ion bombardment

Published:1980-01 Issue:1-3 Volume:168 Page:405-409
ISSN:0029-554X
Container-title:Nuclear Instruments and Methods
language:en
Short-container-title:Nuclear Instruments and Methods

Author:

Naundorf V.,Macht M.-P.

Publisher

Elsevier BV

Subject

General Medicine

Reference18 articles.

1. Depth-profiling of Cu-Ni sandwich samples by secondary ion mass spectrometry

2. Improved depth resolution in Auger depth profiling of multilayered thin films by reactive ion sputtering

3. Ion beam sputtering - the effect of incident ion energy on atomic mixing in subsurface layers

4. The depth resolution of sputter profiling

5. Proc. Conf. Irr. Behav. Met. Mat. for Fast Reactor Core Comp.;Lam,1979

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. In situ assessment of target poisoning evolution in magnetron sputtering;Surface and Coatings Technology;2017-09

2. Evolution of the emissivity of tungsten at high temperature with and without proton bombardment;Acta Materialia;2015-02

3. Quantitative evaluation of sputtering induced surface roughness in depth profiling of polycrystalline multilayers using Auger electron spectroscopy;Thin Solid Films;2003-11

4. Sputtering;digital Encyclopedia of Applied Physics;2003-04-15

5. Quantitative Depth Profiling of Argon in Tungsten Films by Secondary Ion Mass Spectrometry.;Analytical Sciences;2001

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3