Influence of anionic polyelectrolyte addition on ceria dispersion behavior for quartz chemical mechanical polishing
Author:
Publisher
Elsevier BV
Subject
Colloid and Surface Chemistry
Reference23 articles.
1. Laser writing techniques for photomask fabrication using a femtosecond laser;Venkatakrishnan;Appl. Phys. A,2002
2. The evolution of pattern placement metrology for mask making;Beyer;Proc. SPIE,2011
3. Advanced photomask cleaning for 32nm and beyond. Part 1;Kim;Proc. SPIE,2010
4. Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography. Part 1;Lu;Proc. SPIE,2010
5. Effect of polishing technique on the roughness and residual surface film on fused quartz optical flats;Bennett;Appl. Opt.,1970
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