Lifetime evaluation of release agent for ultraviolet nanoimprint lithography-Reference-Cited by-同舟云学术

Lifetime evaluation of release agent for ultraviolet nanoimprint lithography

Published:2012-09 Issue: Volume:97 Page:109-112
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Yamashita Daisuke,Taniguchi Jun,Suzuki Hokuto

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. S.Y. Chou, P.R. Krauss, P.J. Renstrom, Appl. Phys. Lett. 67 (21) 20.

2. Fabrication of Anti-reflection Structure using Photo-curable Polymer

3. Nano-dot arrays with a bit pitch and a track pitch of 25 nm formed by EB writing for 1 Tb/in2 storage

4. Analysis on Deterioration Mechanism of Release Layer in Nanoimprint Process

5. Chemical degradation of fluorinated antisticking treatments in UV nanoimprint lithography

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