Chemical degradation of fluorinated antisticking treatments in UV nanoimprint lithography
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3077172
Reference8 articles.
1. Imprint of sub‐25 nm vias and trenches in polymers
2. Mold-assisted nanolithography: A process for reliable pattern replication
3. Nanoimprint lithography: An old story in modern times? A review
4. Analysis on Deterioration Mechanism of Release Layer in Nanoimprint Process
5. Adhesion between template materials and UV-cured nanoimprint resists
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