Author:
Sakamoto J.,Nishino T.,Kawata H.,Yasuda M.,Hirai Y.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
9 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Integrated in situ self-aligned double patterning process with fluorocarbon as spacer layer;Journal of Vacuum Science & Technology B;2020-05
2. Indirect Nanofabrication;Nanofabrication;2016-08-11
3. Residual layer lithography;Microelectronic Engineering;2014-07
4. Fabrication of Imprint Mold with Nanotrench Patterns by Edge Lithography;Journal of Photopolymer Science and Technology;2014
5. Selective edge lithography for fabricating imprint molds with mixed scale patterns;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-11