Integrated in situ self-aligned double patterning process with fluorocarbon as spacer layer-Reference-Cited by-同舟云学术

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Integrated in situ self-aligned double patterning process with fluorocarbon as spacer layer

Published:2020-05 Issue:3 Volume:38 Page:032601
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Chang Bingdong¹^ORCID

Affiliation:

1. DTU Nanolab, Technical University of Denmark, Ørsteds Plads, Building 347, 2800 Kgs. Lyngby, Denmark

Funder

Villum Fonden

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000089

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Flexible BioMEMS devices enabled by micromachining of plasma-polymerized fluorocarbon;Micro and Nano Engineering;2023-06

2. Thermal reflow of plasma-polymerized fluorocarbon for nanochannels and particle encapsulation;Microelectronic Engineering;2022-06

3. Plasma-Assisted Microcontact Printing;ACS Applied Materials & Interfaces;2022-05-11

4. Radical-Induced Effect on PEALD SiO₂ Films by Applying Positive DC Bias;ECS Journal of Solid State Science and Technology;2022-02-01

5. Atomic Layer Deposition;Kirk‐Othmer Encyclopedia of Chemical Technology;2021-09-16

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