Ion-beam-etching based lift-off for reliable patterning of dense and inverse metallic nanostructures towards 10-nm scale-Reference-Cited by-同舟云学术

Ion-beam-etching based lift-off for reliable patterning of dense and inverse metallic nanostructures towards 10-nm scale

Published:2020-08 Issue: Volume:232 Page:111406
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Zeng Pei,Liu Qing,Zheng Mengjie,Chen Yiqin,Liu Guoyou,Duan Huigao

Funder

Micro-focus X-ray Fresnel lens batch preparation technology

National Natural Science Foundation of China

Science and Technology Bureau Foundation of Changsha City

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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