Author:
Baklanov Mikhail R.,Mogilnikov Konstantin P.,Le Quoc Toan
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference12 articles.
1. Low dielectric constant materials for microelectronics
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3. Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma
4. Removal of Plasma-Modified Low-k Layer Using Dilute HF: Influence of Concentration
5. Determination of pore size distribution in thin films by ellipsometric porosimetry
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