Fabrication of air gap dielectrics by nanoimprint lithography-Reference-Cited by-同舟云学术

Fabrication of air gap dielectrics by nanoimprint lithography

Published:2012-10 Issue: Volume:98 Page:89-96
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Erenturk Burcin,Park Myoung-Hwan,Rotello Vincent M.,Carter Kenneth R.

Funder

NSEC, Center for Hierarchical Manufacturing

National Science Foundation

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference44 articles.

1. Particle-Packing Phenomena and Their Application in Materials Processing

2. Low-Dielectric, Nanoporous Organosilicate Films Prepared via Inorganic/Organic Polymer Hybrid Templates

3. Application of the low dielectric methyl-silsesquiazane (MSZ) as a passivation layer on TFT-LCD

4. a-SiC:H low-k deposition as copper diffusion barrier layer in advanced microelectronic interconnections

5. Low-operating-voltage polymeric transistor with solution-processed low-k polymer/high-k metal-oxide bilayer insulators

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Graphene nanostrip transverse magnetic dual-channel refractive index sensor;Optical Materials Express;2023-07-06

2. The fabrication of flip-covered plasmonic nanostructure surfaces with enhanced wear resistance;Optics Communications;2017-01

3. Nanoimprint lithography of deoxyribonucleic acid biopolymer films;Journal of Micro/Nanolithography, MEMS, and MOEMS;2013-12-16