Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography-Reference-Cited by-同舟云学术

Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography

Published:2015-08 Issue: Volume:143 Page:81-85
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Park Eun-Sang,Shamsi Zahid Hussain,Kim Ji-Won,Kim Dai-Gyoung,Park Jin-Goo,Ahn Jin-Ho,Oh Hye-Keun

Funder

Ministry of Trade, Industry & Energy

Korea Semiconductor Research Consortium

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference32 articles.

1. EUV Lithography;Bakshi,2009

2. Investigation of EUV pellicle feasibility

3. S. Akiyama, Y. Kubota, U.S. Patent No. 8,518,612, U.S. Patent and Trademark Office, Washington, DC, 2013.

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