Fabrication of extreme ultraviolet lithography pellicle with nanometer-thick graphite film by sublimation of camphor supporting layer
Author:
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering
Link
https://iopscience.iop.org/article/10.1088/1361-6528/ac19d9/pdf
Reference36 articles.
1. Lithography gets extreme;Wagner;Nat. Photon.,2010
2. Effect of Extreme-Ultraviolet Pellicle Support to Patterned Mask;Ko;Proc. SPIE,2012
3. Investigation of EUV Pellicle Feasibility;Scaccabarozzi;Proc. SPIE,2013
4. Progress on EUV Pellicle Development;Zoldesi;Proc. SPIE,2014
5. EUV Pellicle Development for Mask Defect Control;Shroff;Proc. SPIE,2006
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