Author:
Potter G.,Tokranova N.,Rastegar A.,Castracane J.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference18 articles.
1. Front End Processes, International Technology Roadmap for Semiconductors,2011
2. Particle cleaning technologies to meet advanced semiconductor device process requirements;Okorn-Schmidt;ECS J. Solid State Sci. Technol.,2014
3. Ultrasonic cleaning: an historical perspective;Mason;Ultrason. Sonochem.,2016
4. The evolution of silicon wafer cleaning technology;Kern;J. Electrochem. Soc.,1990
5. Acoustic streaming;Lighthill;J. Sound Vib.,1978
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