On the applicability of self-consistent global model for the characterization of Cl2/Ar inductively coupled plasma-Reference-Cited by-同舟云学术

On the applicability of self-consistent global model for the characterization of Cl2/Ar inductively coupled plasma

Published:2007-01 Issue:1 Volume:84 Page:136-143
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Efremov A.M.,Kim Gwan-Ha,Kim Jong-Gyu,Bogomolov A.V.,Kim Chang-Il

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Glow Discharge Processes: Sputtering and Plasma Etching;Chapman,1980

2. Applications of Plasma Processes to VLSI Technology;Sugano,1990

3. Global model of Ar, O2, Cl2, and Ar/O2 high‐density plasma discharges

4. Spatially Averaged (Global) Model of Time Modulated High Density Chlorine Plasmas

5. Modelling plasma discharges at high electronegativity

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