Author:
Efremov A. M.,Betelin V. B.,Kwon K.-H.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference28 articles.
1. Advanced Plasma Processing Technology, New York: John Wiley & Sons, 2008.
2. Silicon Processing for the VLSI Era;S. Wolf,2000
3. Nojiri, K., Dry Etching Technology for Semiconductors, Cham: Springer, 2015. https://doi.org/10.1007/978-3-319-10295-5
4. Lieberman, M.A. and Lichtenberg, A.J., Principles of Plasma Discharges and Materials Processing, New York: John Wiley & Sons, 2005, 2nd ed.
5. Roosmalen, J., Baggerman, J.A.G., and Brader, S.J.H., Dry Etching for VLSI, New-York: Plenum Press, 1991.