Author:
Amirov I. I.,Izyumov M. O.,Efremov A. M.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference34 articles.
1. Nojiri, K., Dry Etching Technology for Semiconductors, Tokyo: Springer, 2015.
2. Roosmalen, J., Baggerman, J.A.G., and Brader, S.J., Dry Etching for VLSI, New York: Plenum, 1991.
3. Industrial Plasma Engineering;J.R. Rooth,2001
4. Lieberman, M.A. and Lichtenberg, A.J., Principles of Plasma Discharges and Materials Processing, New York: Wiley, 1994.
5. Vitale, S., Chae, H., and Sawin, H.H., Silicon etching yields in F2, Cl2, Br2, and HBr high density plasmas, J. Vac. Sci. Technol., A, 2001, vol. 19, no. 5, pp. 2197–2206.