Author:
Chapelon L.L.,Vitiello J.,Gonchond J.P.,Barbier D.,Torres J.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. J. Lee, M. Moinpour, H.C. Liu, T. Abell, in: Proceedings of the 2003 MRS Spring Meeting, San Francisco, CA (Mater. Res. Soc. Proc. 767, Pittsburgh, PA, 2003) F7.4.
2. F. Iacopi, D. Degryse, I. Vos, M. Patz, K. Maex, in: Proceedings of the 2003 MRS Fall Meeting, Boston, MA (Mater. Res. Soc. Proc. 795, Pittsburgh, PA, 2004) U4.3.
3. Supercritical carbon dioxide extraction to produce low-k plasma enhanced chemical vapor deposited dielectric films
4. C. Waldfried, Fundamentals of UV curing low-k dielectrics, in: Advanced Dielectric Materials Axcelis Seminar in San Diego, 2004.
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