Hybrid lithography: The marriage between optical and e-beam lithography. A method to study process integration and device performance for advanced device nodes-Reference-Cited by-同舟云学术

Hybrid lithography: The marriage between optical and e-beam lithography. A method to study process integration and device performance for advanced device nodes

Published:2006-04 Issue:4-9 Volume:83 Page:754-761
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Steen Steven,McNab Sharee J.,Sekaric Lidija,Babich Inna,Patel Jyotica,Bucchignano Jim,Rooks Michael,Fried David M.,Topol Anna W.,Brancaccio Jim R.,Yu Roy,Hergenrother John M.,Doyle James P.,Nunes Ron,Viswanathan Raman G.,Purushothaman Sampath,Rothwell Mary Beth

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. First microprocessors with immersion lithography

2. An electron‐beam/optical‐hybrid lithography approach to submicrometer electronic devices

3. Electron-beam lithography for advanced device prototyping: Process tool metrology

4. Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions

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