Lithographic performance of resist ma-N 1402 in an e-beam/i-line stepper intra-level mix and match approach
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SPIE
Reference9 articles.
1. Fabrication of sub-100 nm patterns in SiO2 templates by electron-beam lithography for the growth of periodic III–V semiconductor nanostructures
2. Mix-and-match lithography and cryogenic etching for NIL template fabrication
3. Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-Match Lithography with 100 nm Resolution
4. Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25μm CMOS
5. Hybrid lithography: The marriage between optical and e-beam lithography. A method to study process integration and device performance for advanced device nodes
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