An electron‐beam/optical‐hybrid lithography approach to submicrometer electronic devices
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Link
http://avs.scitation.org/doi/pdf/10.1116/1.571191
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Nanofabricated Ultraflexible Electrode Arrays for High‐Density Intracortical Recording;Advanced Science;2018-03-10
2. Close-Packed Silicon Microelectrodes for Scalable Spatially Oversampled Neural Recording;IEEE Transactions on Biomedical Engineering;2016-01
3. Experimental analysis for process control in hybrid lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11
4. Potential and limitations of a T-NIL/UVL hybrid process;Microelectronic Engineering;2010-05
5. Positive or negative tone resist for a T-NIL/UVL hybrid process;SPIE Proceedings;2010-02-03
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