Nickel stamp fabrication using step & stamp imprint lithography-Reference-Cited by-同舟云学术

Nickel stamp fabrication using step & stamp imprint lithography

Published:2006-04 Issue:4-9 Volume:83 Page:948-950
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Haatainen Tomi,Majander Päivi,Riekkinen Tommi,Ahopelto Jouni

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Nanoimprint lithography

3. Emerging Lithographic Technologies IV;Haatainen,2000

4. Alternative Lithography, Unleashing the Potentials of Nanotechnology;Ahopelto,2003

5. P. Annala, J. Kaitila, J. Salonen, I. Suni, in: 17th Nordic Semiconductor Meeting 17NSM, Trondheim, NO, 17–20 June 1996. Lindsay Ross International, 1996, pp. 115–118.

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