Affiliation:
1. King Abdullah University of Science and Technology (KAUST), Advanced Semiconductor Laboratory, Thuwal 23955-6900, Saudi Arabia
Abstract
This work studies the impact of the silicon (Si) loading effect induced by deep reactive ion etching (DRIE) of silicon master molds on the UV-nanoimprint lithography (NIL) patterning of nanofeatures.
Funder
Global Collaborative Research, King Abdullah University of Science and Technology
King Abdullah University of Science and Technology
Publisher
Royal Society of Chemistry (RSC)
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