Funder
National Research Foundation of Korea
NRF
MEST
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. Chemical-Mechanical Planarization of Semiconductor Materials;Oliver,2013
2. Advances in Chemical Mechanical Planarization (CMP);Suryadevara,2016
3. Advances in characterization of CMP consumables;Moinpour;MRS Bull.,2002
4. CMP consumables II: pad;Cook;Semiconduct. Semimetals,1999
5. Investigation of the pad-conditioning performance deterioration in the chemical mechanical polishing process;Kim;Wear,2017
Cited by
9 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献