Reduction of plasma-induced damage during HDP-CVD oxide deposition in the inter layer dielectric (ILD) process-Reference-Cited by-同舟云学术

Reduction of plasma-induced damage during HDP-CVD oxide deposition in the inter layer dielectric (ILD) process

Published:2011-08 Issue:8 Volume:88 Page:2489-2491
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Lee Jun-woo,Kim Hwan-woo,Kim Hyung-joon,Kim Seog-gyu,Lee Kyu-pil,Lee Soo-cheol,Park Dong-gun,Choi Byoung-deog

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. S.W. Lee, C.M. Ahn, B.G. Kim, S.H. Chang, D.H. Han, C.Y. An, J.H. Won, J.Y. Kim, S.W. Jung, D.H. Shin, K.G. Oh, W.S. Lee, D.G. Park, in: ICICDT, 2004, pp. 349–353.

2. K.M. Byun, D.H. Kim, Y.W. Cha, S.H. Lee, M. Kim, J.B. Lee, I.S. Park, H.D. Lee, C.L. Song, in: ICICDT, 2005, pp. 99–102.

3. K.P. Cheung, in: International Symposium on P2ID, 2000, pp. 161–163.

4. M. Joshi, J.P. McVittie, K. Saraswat, C. Cismaru, J.L. Shohet, in: International Symposium on P2ID, 2000, pp. 14–17.

5. M. Joshi, J.P. McVittie, K. Saraswat, in: International Symposium on P2ID, 2000, pp. 157–160.

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