mr-NIL 6000LT – Epoxy-based curing resist for combined thermal and UV nanoimprint lithography below 50°C-Reference-Cited by-同舟云学术

mr-NIL 6000LT – Epoxy-based curing resist for combined thermal and UV nanoimprint lithography below 50°C

Published:2009-04 Issue:4-6 Volume:86 Page:722-725
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Schuster Christine,Reuther Freimut,Kolander Anett,Gruetzner Gabi

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference2 articles.

1. C. Schuster, M. Kubenz, F. Reuther, M. Fink, G. Grützner, mr-NIL 6000 – New epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography, in: Proceedings of SPIE 6517 2007, 65172B.

2. A. Klukowska, A. Kolander, I. Bergmair, M. Mühlberger, H. Leichtfried, F. Reuther, G. Grützner, R. Schöftner, Micro- and nano-engineering 2008, International conference, Athens, Greece, Sept. 15–18, 2008.

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