Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films-Reference-Cited by-同舟云学术

Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films

Published:2006-11 Issue:11-12 Volume:83 Page:2042-2054
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Lavoie C.,Detavernier C.,Cabral C.,d’Heurle F.M.,Kellock A.J.,Jordan-Sweet J.,Harper J.M.E.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference126 articles.

1. Nucleation‐controlled thin‐film interactions: Some silicides

2. The formation of NiSi from Ni2Si studied with a platinum marker

3. Analysis of marker motion in thin‐film silicide formation

4. Silicide formation correlated with surface resistivity measurements

5. Studies of formation of silicides and their barrier heights to silicon

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