Subject
Metals and Alloys,Polymers and Plastics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference50 articles.
1. Towards implementation of a nickel silicide process for CMOS technologies;Lavoie;Microelectron. Eng.,2003
2. Enhancement of thermal stability of NiSi films on (100)Si and (111)Si by Pt addition;Mangelinck;Appl. Phys. Lett.,1999
3. Influence of Pt addition on the texture of NiSi on Si(001);Detavernier;Appl. Phys. Lett.,2004
4. Contact resistance reduction of Pt-incorporated NiSi for continuous CMOS scaling ∼ Atomic level analysis of Pt/B/As distribution within silicide films;Sonehara,2008
5. 14nm FDSOI technology for high speed and energy efficient applications;Weber,2014
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献