Layout analysis as supporting tool for failure localization: Basic principles and case studies-Reference-Cited by-同舟云学术

Layout analysis as supporting tool for failure localization: Basic principles and case studies

Published:2008-08 Issue:8-9 Volume:48 Page:1343-1348
ISSN:0026-2714
Container-title:Microelectronics Reliability
language:en
Short-container-title:Microelectronics Reliability

Author:

Hartmann C.,Wieberneit M.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference8 articles.

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3. Failure analysis case studies using the IR-OBIRCH (infrared optical beam induced resistance change) method;Nikawa;Test Symp,1999

4. Shade G. Photon emission microscopy. Microelectronics failure analysis desk reference. 5th ed.; 2004. p. 347–55.

5. ABCs of photon emission microscopy;Bruce;Electron Dev Fail Anal,2003

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