Author:
Sleeckx E.,Schaekers M.,Shi X.,Kunnen E.,Degroote B.,Jurczak M.,de Potter de ten Broeck M.,Augendre E.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference4 articles.
1. Plasma Deposition of SiNxHy: Process Chemistry vs Film Properties
2. Ito S et al. Electron Devices Meeting, 2000. IEDM Technical Digest. International, 10–13 December 2000. p. 247–50
3. Shimizu A et al. Electron Devices Meeting, 2001. IEDM Technical Digest. International, 2–5 December 2001. p. 19.4.1–4
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