Author:
Pecora A.,Maiolo L.,Bonfiglietti A.,Cuscunà M.,Mecarini F.,Mariucci L.,Fortunato G.,Young N.D.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. Physical and electrical properties of low temperature (<100 °C) SiO2 films deposited by electron cyclotron resonance plasmas
2. Suzuki K, Tada M, Yamazi Y, Ishizuka Y. In: Proc. AM-LCD 98, Tokyo, July 9–10, 1998. p. 5–8
3. Low-temperature polysilicon thin-film transistor driving with integrated driver for high-resolution light emitting polymer display
4. Young ND, McCulloch DJ, Bunn RM. In: Proc. AM-LCD 97, Tokyo, September 11–12, 1998. p. 47
5. Low‐temperature deposition of high‐quality silicon dioxide by plasma‐enhanced chemical vapor deposition
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