Low‐temperature deposition of high‐quality silicon dioxide by plasma‐enhanced chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.337726
Reference19 articles.
1. Full color liquid crystal television addressed by amorphous silicon TFTs
2. Fowler‐Nordheim Tunneling into Thermally Grown SiO2
3. Deposition of Plasma Silicon Oxide Thin Films in a Production Planar Reactor
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