Alternative surface reaction route in the atomic layer deposition of NbN thin films for reduced resistivity-Reference-Cited by-同舟云学术

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Alternative surface reaction route in the atomic layer deposition of NbN thin films for reduced resistivity

Published:2023-08 Issue: Volume:952 Page:170033
ISSN:0925-8388
Container-title:Journal of Alloys and Compounds
language:en
Short-container-title:Journal of Alloys and Compounds

Author:

Lee Hyeok Jae,Jang Seo Young,Lee Hye Min,Sung Ju Young,Kim Se Eun,Jeon Jae Deock,Yun Yewon,Lee Sang Woon

Funder

Ministry of Science, ICT and Future Planning

National Research Foundation of Korea

Ministry of Science ICT and Future Planning

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials

Reference50 articles.

1. Lifetime of thin oxide and oxide-nitride-oxide dielectrics within trench capacitors for DRAMs;Hiergeist;IEEE Trans. Electron Devices,1989

2. Alternative surface reaction route in the atomic layer deposition of titanium nitride thin films for electrode applications;Lee;ACS Appl. Electron. Mater.,2021

3. The other transistor: early history of the metal-oxide semiconductor field-effect transistor;Arns;Eng. Sci. Educ. J.,1998

4. Thin nitride films on textured polysilicon to increase multimegabit DRAM cell charge capacity;Fazan;IEEE Electron Device Lett.,1990

5. Remote plasma enhanced atomic layer deposition of titanium nitride film using metal organic precursor (C12H23N3Ti) and N2 plasma;Kim;Appl. Surf. Sci.,2021

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: A brief review;Current Applied Physics;2024-08

2. Mechanistic analysis on low temperature thermal atomic layer deposition of nitrides utilizing H2S;Journal of Vacuum Science & Technology A;2023-10-16

3. Self-supporting NiO-coated activated carbon nanofibers based on atomic layer deposition for supercapacitor;Journal of Alloys and Compounds;2023-10

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