Atmospherically sintered copper-base alloy application film with self-assembled barrier layer on silicon substrate for silicon photovoltaics-Reference-Cited by-同舟云学术

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Atmospherically sintered copper-base alloy application film with self-assembled barrier layer on silicon substrate for silicon photovoltaics

Published:2018-08 Issue: Volume:757 Page:333-339
ISSN:0925-8388
Container-title:Journal of Alloys and Compounds
language:en
Short-container-title:Journal of Alloys and Compounds

Author:

Adachi Shuichiro,Nojiri Takeshi,Kato Takahiko,Watanabe Seiichi,Yoshida Masato

Funder

Nanotechnology Platform

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials

Reference19 articles.

1. Copper oxide films;Miley;J. Am. Chem. Soc.,1937

2. The oxidation of metals;Campbell;Trans. Electrochem. Soc.,1947

3. Oxidation of the thin single crystal film of copper;Shirai;J. Phys. Soc. Jpn.,1947

4. The oxidation of copper films to CuO0.67;Wieder;J. Phys. Chem.,1962

5. A crystalline metallic copper network application film produced by high-temperature atmospheric sintering;Kato;IEEE J. Photovoltaics,2012

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