Plasmon loss and valence band structure of silicon-based alloys deposited by hot wire chemical vapor deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials
Reference24 articles.
1. Application of hot-wire chemical vapor-deposited Si:H films in thin film transistors and solar cells
2. Preliminary results on a-SiC:H based thin film light emitting diode by hot wire CVD
3. Structural properties of a-SiC:H- and a-SiN:H-Alloys from XPS-analyses and IR-absorption
4. Defect characterization of a-SiC:H and a-SiN:H alloys produced by ultrahigh vacuum plasma enhanced chemical vapor deposition in different plasma conditions
5. Multiphase structure of hydrogen diluted a-SiC:H deposited by HWCVD
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2. Effect of H 2 addition during PECVD on the moisture barrier property and environmental stability of H:SiN x film;Journal of the American Ceramic Society;2021-07-13
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4. Biocompatibility of Hydrogen-Diluted Amorphous Silicon Carbide Thin Films for Artificial Heart Valve Coating;Journal of Materials Engineering and Performance;2018-01-31
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