Author:
Stapinski T.,Ambrosone G.,Coscia U.,Giorgis F.,Pirri C.F.
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference24 articles.
1. R. Platz, D. Fischer, A. Shah, Amorphous Silicon Technology 1995, Symp. Proc. vol. 377, Material Research Society, Pittsburgh, Pennsylvania, 1995, p. 645.
2. J.F. Nijs, J.j. Symons, in: J. Kanicki (Ed.), Amorphous and Microcrystalline Semiconductor Devices, Artech House, Boston, 1992, vol. 2, ch. 12.
3. A metal-amorphous silicon-germanium alloy Schottky barrier for infrared optoelectronic IC on glass substrate application
4. D. Kruangam, in: J. Kanicki, Amorphous and Microcrystalline Semiconductor Devices, Artech House, Boston, 1991, vol. 1, ch. 6.
5. Wide band gap amorphous silicon-based alloys
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