Effect of oxygen partial pressure on the structural and optical properties of dc sputtered ITO thin films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials
Reference28 articles.
1. Influence of O2 admixture and sputtering pressure on the properties of ITO thin films deposited on PET substrate using RF reactive magnetron sputtering
2. Preparation of indium tin oxide nanoparticles and their application to near IR-reflective film
3. ITO films for antireflective and antistatic tube coatings prepared by d.c. magnetron sputtering
4. ITO-free wrap through organic solar cells—A module concept for cost-efficient reel-to-reel production
5. Electrical and optical characteristics of indium tin oxide thin films deposited by cathodic sputtering for top emitting organic electroluminescent devices
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1. Perspective Coatings Based on Structured Conducting ITO Thin Films for General Optoelectronic Applications;Coatings;2024-01-31
2. Influence of oxygen on the optical and electrical properties of magnetron-sputtered indium tin oxide thin films at ambient temperature;Thin Solid Films;2024-01
3. Formation of Transparent Contacts to p-NiO by DC Magnetron Sputtering ITO;2023 International Conference on Electrical Engineering and Photonics (EExPolytech);2023-10-19
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