Influence of O2 admixture and sputtering pressure on the properties of ITO thin films deposited on PET substrate using RF reactive magnetron sputtering-Reference-Cited by-同舟云学术

Influence of O2 admixture and sputtering pressure on the properties of ITO thin films deposited on PET substrate using RF reactive magnetron sputtering

Published:2003-08 Issue:2-3 Volume:173 Page:299-308
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Kim Young-Soon,Park Young-Chul,Ansari S.G.,Lee Jeong-Young,Lee Byung-Soo,Shin Hyung-Shik

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference27 articles.

1. Evaporated Sn‐doped In2O3films: Basic optical properties and applications to energy‐efficient windows

2. Optical and Photovoltaic Characteristics of In‐Modified SnO2 Thin Films

3. Electrochromic devices for transmissive and reflective light control

4. Mechanism of carrier transport in highly efficient solar cells having indium tin oxide/Si junctions

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