Effect of deposition parameters on the growth rate and dielectric properties of the Ba(SnxTi1−x)O3 thin films prepared by radio frequency magnetron sputtering-Reference-Cited by-同舟云学术

Effect of deposition parameters on the growth rate and dielectric properties of the Ba(SnxTi1−x)O3 thin films prepared by radio frequency magnetron sputtering

Published:2006-01 Issue:15 Volume:26 Page:3211-3219
ISSN:0955-2219
Container-title:Journal of the European Ceramic Society
language:en
Short-container-title:Journal of the European Ceramic Society

Author:

Huang Hong-Hsin,Wang Moo-Chin,Chen Chung-Yuan,Wu Nan-Chung,Lin Huey-Jiuan

Publisher

Elsevier BV

Subject

Materials Chemistry,Ceramics and Composites

Reference32 articles.

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3. Dielectric properties of the nanocrystalline barium titanite thin films deposited by RF magnetron sputtering;Hsi;Jpn. J. Appl. Phys.,2003

4. Characterization and leakage current density of radio frequency magnetron sputtered nanocrystalline SrTiO3 thin films;Wang;J. Cryst. Growth,2004

5. Property modification of ferroelectric Pb(Zr,Ti)O3 thin films by low-energy oxygen ion bombardment during film growth;Hu;Appl. Phys. Lett.,1992

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