Future trends in electron beam testing-Reference-Cited by-同舟云学术

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Future trends in electron beam testing

Published:1987-01 Issue:2-4 Volume:7 Page:435-444
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Wolfgang Eckhard

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference38 articles.

1. Characterization of Very High Speed Semiconductor Devices and Integrated Circuits: Critical Review Technology,1987

2. 1987 International Reliability Physics Symposium,1987

3. Electrochemical Society Meeting, May10–15th, Philadelphia, Pennsylvania, Extended Abstracts Nr. 113–120, 129–131.

4. The 31st International Symposium on Electron, Ion and Photon Beams,1987

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2. Generation of inherently periodical test patterns for the e-beam test of scan-based designs;Microelectronic Engineering;1994-03

3. Optimisation in resolving the buried line potential of VLSI circuits;Electronics Letters;1993

4. On the deterministic generation of short test sequences for the e-beam test of scan-based designs;Microelectronic Engineering;1992-03

5. Advances in Voltage-Contrast Detectors in Scanning Electron Microscopes;Advances in Optical and Electron Microscopy;1991

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