Physics of high power impulse magnetron sputtering discharges
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Elsevier
Reference159 articles.
1. Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides;Aiempanakit;Thin Solid Films,2011
2. On the deposition rate in a high power pulsed magnetron sputtering discharge;Alami;Applied Physics Letters,2006
3. Self-sputtering runaway in high power impulse magnetron sputtering: the role of secondary electrons and multiply charged metal ions;Anders;Applied Physics Letters,2008
4. Deposition rates of high power impulse magnetron sputtering: physics and economics;Anders;Journal of Vacuum Science and Technology A,2010
5. Discharge physics of high power impulse magnetron sputtering;Anders;Surface and Coatings Technology,2011
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