Laser Direct Writing for VLSI* *This work was supported by the Defense Advanced Research Projects Agency, the Department of the Air Force (in part under a specific program sponsored by the Air Force Office of Scientific Research), and the Army Research Office.-Reference-Cited by-同舟云学术

Laser Direct Writing for VLSI* *This work was supported by the Defense Advanced Research Projects Agency, the Department of the Air Force (in part under a specific program sponsored by the Air Force Office of Scientific Research), and the Army Research Office.

Published:1983 Issue: Volume: Page:129-164
ISSN:0736-7031
Container-title:VLSI Electronics Microstructure Science
language:
Short-container-title:

Author:

EHRLICH D.J.,TSAO J.Y.

Publisher

Elsevier

Reference63 articles.

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2. One-gate-wide CMOS inverter on laser-recrystallized polysilicon;Gibbons;IEEE Electric Device Lett.,1980

3. Effect of laser recrystallization of polysilicon on the underlying substrate;Kamins;IEEE Electron Device Lett.,1982

4. Principles of optical lithography;King,1981

5. Deposition of metallic films by electron impact decomposition of organometallic vapors;Baker;Rev. Sci. Instrum.,1961

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