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Directed self-assembly of poly(styrene-b-vinyl acetate) block copolymers on chemical patterns for sub-10 nm nanopatterning via thermal annealing

  • Published:2022-10 Issue: Volume:257 Page:125277
  • ISSN:0032-3861
  • Container-title:Polymer
  • language:en
  • Short-container-title:Polymer

Author:

Lai Hanwen,Zhang Xiaohui,Huang Guangcheng,Liu Yadong,Li Weihua,Ji Shengxiang

Funder

National Natural Science Foundation of China

Department of Science and Technology of Jilin Province

Publisher

Elsevier BV

Subject

Polymers and Plastics,Materials Chemistry,Organic Chemistry

Reference60 articles.

1. Directed self-assembly of block copolymers on chemical patterns: a platform for nanofabrication;Ji;Prog Polym Sci,2016

2. From self-assembled monolayers to chemically patterned brushes: controlling the orientation of block copolymer domains in films by substrate modification;Jin;Chinese Journal of Polymer Science,2016

3. Block copolymer nanopatterning for nonsemiconductor device applications;Yang;ACS Appl Mater Interfaces,2022

4. Directed self-assembly of block copolymers for next generation nanolithography;Jeong;Mater Today,2013

5. International Roadmap for Devices and Systems (IRDS™) 2021 Edition. https://irds.ieee.org/editions/2021 , (Accessed 12 Mar 2022).

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