Block Copolymer Nanopatterning for Nonsemiconductor Device Applications-Reference-Cited by-同舟云学术

Block Copolymer Nanopatterning for Nonsemiconductor Device Applications

Published:2022-03-01 Issue:10 Volume:14 Page:12011-12037
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Yang Geon Gug¹,Choi Hee Jae¹,Han Kyu Hyo¹,Kim Jang Hwan¹,Lee Chan Woo¹,Jung Edwin Ino¹,Jin Hyeong Min²,Kim Sang Ouk¹^ORCID

Affiliation:

1. National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea

2. Department of Organic Materials Engineering, Chungnam National University, Daejeon, 34134, Republic of Korea

Funder

National Research Foundation of Korea

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.1c22836

Reference244 articles.

1. Theory of Microphase Separation in Block Copolymers

2. Block Copolymer Thermodynamics: Theory and Experiment

3. Nanotechnology with Soft Materials

4. Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond

5. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

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