Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond-Reference-Cited by-同舟云学术

Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond

Published:2018-10 Issue:10 Volume:1 Page:562-569
ISSN:2520-1131
Container-title:Nature Electronics
language:en
Short-container-title:Nat Electron

Author:

Liu Chi-Chun^ORCID,Franke Elliott,Mignot Yann,Xie Ruilong,Yeung Chun Wing,Zhang Jingyun,Chi Cheng,Zhang Chen,Farrell Richard,Lai Kafai,Tsai Hsinyu,Felix Nelson,Corliss Daniel

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://www.nature.com/articles/s41928-018-0147-4.pdf

Reference37 articles.

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2. Black, C. T. et al. Polymer self assembly in semiconductor microelectronics. IBM J. Res. Dev. 51, 605–633 (2007).

3. Thurn-Albrecht, T. et al. Ultrahigh-density nanowire arrays grown in self-assembled diblock copolymer templates. Science 290, 2126–2129 (2000).

4. Segalman, R. A., Yokoyama, H. & Kramer, E. J. Graphoepitaxy of spherical domain block copolymer films. Adv. Mater. 13, 1152–1155 (2001).

5. Bita, I. et al. Graphoepitaxy of self-assembled block copolymers on two-dimensional periodic patterned templates. Science 321, 939–943 (2008).

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