The chemistry and application of nonchemically amplified (non-CA) chain-scission resists-Reference-Cited by-同舟云学术

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The chemistry and application of nonchemically amplified (non-CA) chain-scission resists

Published:2016 Issue: Volume: Page:193-210
ISSN:1876-2778
Container-title:Materials and Processes for Next Generation Lithography
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Author:

Whittaker Andrew K.

Publisher

Elsevier

Reference100 articles.

1. Deep uv lithography;Lin;J Vac Sci Technol,1975

2. Progress in EUV resist performance;Goethals;J Photopolym Sci Technol,2006

3. Characterization of extreme ultraviolet resists with interference lithography;Gronheid;Microelectron Eng,2006

4. Stochastic exposure kinetics of extreme ultraviolet photoresists: simulation study;Mack;J Micro Nanolithogr MEMS MOEMS,2011

5. Organic resist materials–theory and chemistry;Willson,1983

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Synthesis of micro-crosslinked adamantane-containing matrix resins designed for deep-UV lithography resists and their application in nanoimprint lithography;Nanoscale;2024

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