Synthesis of micro-crosslinked adamantane-containing matrix resins designed for deep-UV lithography resists and their application in nanoimprint lithography-Reference-Cited by-同舟云学术

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Synthesis of micro-crosslinked adamantane-containing matrix resins designed for deep-UV lithography resists and their application in nanoimprint lithography

Published:2024 Issue:24 Volume:16 Page:11651-11662
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Yang Zi-Hao¹,Zhao Jing²,Cai Ya-Juan³,Yang Xu²,Zhao Chuan-Zhe¹,Liu Yang¹,Li Yi-Bo¹,Sang Ke-Xiao¹,Sun Yi-Xing¹,Wu Ya-Ge¹,Wei Nan-Jun¹,Gai Jing-Gang¹^ORCID

Affiliation:

1. State Key Laboratory of Polymer Materials Engineering, Polymer Research Institute of Sichuan University, Chengdu, Sichuan 610065, China

2. PetroChina Liaoyang Petrochemical Company, No. 7 Torch Street, Hongwei District, Liaoyang, Liaoning 111000, China

3. Sichuan Guojian Inspection Co., Ltd, No. 17, Section 1, Kangcheng Road, Jiangyang District, Luzhou 646099, Sichuan, China

Abstract

A certain type of photoresist used for deep-UV lithography (DUVL) can also be used for other types of photolithography.

Funder

National Natural Science Foundation of China

State Key Laboratory of Polymer Materials Engineering

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/NR/D4NR00844H

Reference33 articles.

1. A review of roll-to-roll nanoimprint lithography

2. Advances in Nanoimprint Lithography

3. Fabrication of Transistors on Flexible Substrates: from Mass-Printing to High-Resolution Alternative Lithography Strategies

4. Imprint Lithography with Degradable Elastomeric Polyanhydrides

5. Interfacial Interactions during Demolding in Nanoimprint Lithography

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