Layout dependent hot-carrier-injection-induced pLDMOS degradation from a non-destructive characterization viewpoint

Author:

Zhao D.,Wang Y.,Chen Y.,Pang Z.,Fu Z.,Zhou Z.,Liu F.,Dong G.,He Y.

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. A new lateral power MOSFET for smart power ICs: the LUDMOS concept;Zitouni;Microelectron J,1999

2. LDMOS in SOI technology with very-thin silicon film;Bawedin;Solid-State Electron,2004

3. Influence of design considerations on hot carrier injection degradation of STI-based LDMOS transistors;Alimin,2018

4. On-resistance degradation induced by hot-carrier injection in LDMOS transistors with STI in the drift region;Chen;IEEE Trans EDL,2008

5. Degradation mechanisms in SOI n-channel LDMOSFETs;Vandooren;Microelectron Eng,2001

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