Combined effects of NH3 and NF3 post plasma treatment on the performance of spray coated ZnO thin film transistors-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Combined effects of NH3 and NF3 post plasma treatment on the performance of spray coated ZnO thin film transistors

Published:2021-12 Issue: Volume:186 Page:108178
ISSN:0038-1101
Container-title:Solid-State Electronics
language:en
Short-container-title:Solid-State Electronics

Author:

Ali Arqum,Saha Jewel Kumer,Siddik Abu Bakar,Islam Md Mobaidul,Jang Jin

Funder

Ministry of Trade, Industry and Energy

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference30 articles.

1. Highly stable, nanocrystalline, ZnO thin-film transistor by spray pyrolysis using high-K dielectric;Saha;IEEE Trans Electron Devices,2020

2. Performance improvement for solution-processed high-mobility ZnO thin-film transistors;Li;J Phys D: Appl Phys,2008

3. Remarkable Stability Improvement of ZnO TFT with Al2O3 Gate Insulator by Yttrium Passivation with Spray Pyrolysis;Saha;Nanomaterials,2020

4. Fabrication conditions for solution processed high mobility ZnO TFT;Li;J Mater Chem,2009

5. O-vacancy as the origin of NBIS instability in amorphous IGZO thin film transistors;Ryu;Appl Phys Lett,2010

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High-Performance Low-Voltage Thin-Film Transistors: Experimental and Simulation Validation of Atmospheric Pressure Plasma-Assisted Li₅AlO₄ Metal Oxide Solution Processing;ACS Applied Materials & Interfaces;2024-08-09

2. Enhancement of electrical characteristics of SnGaO thin-film transistors via argon and oxygen plasma treatment;Vacuum;2024-07

3. Influence of NF3 Plasma-Treated HfO2 Gate Insulator Surface on Tin Oxide Thin-Film Transistors;Materials;2023-11-15

4. Improvement of PrIZO Thin Films by O₂ Plasma Treatment Combined With Low-Temperature Annealing for Thin-Film Transistors;IEEE Transactions on Electron Devices;2023-11

5. Low-Cost and High-Performance, Back-Channel Etched InGaZnO Thin Film Transistors by Spray Pyrolysis;IEEE Electron Device Letters;2023-10

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3