High-Performance Low-Voltage Thin-Film Transistors: Experimental and Simulation Validation of Atmospheric Pressure Plasma-Assisted Li<sub>5</sub>AlO<sub>4</sub> Metal Oxide Solution Processing-Reference-Cited by-同舟云学术

High-Performance Low-Voltage Thin-Film Transistors: Experimental and Simulation Validation of Atmospheric Pressure Plasma-Assisted Li₅AlO₄ Metal Oxide Solution Processing

Published:2024-08-09 Issue:33 Volume:16 Page:43682-43693
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Sharma Anand¹²^ORCID,Acharya Vishwas³,Marothya Himanshu³,Singh Satya Veer⁴^ORCID,Kumar Sandeep⁵^ORCID,Pal Bhola Nath²^ORCID

Affiliation:

1. Department of Physics and Astronomy, Louisiana State University, Baton Rouge, Louisiana 70803, United States

2. School of Materials Science and Technology, Indian Institute of Technology (BHU), Varanasi 221 005, India

3. Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai 400 076, India

4. Department of Chemistry, Indian Institute of Technology Kanpur, Kalyanpur, Kanpur 208 016, India

5. Department of Physics, Motilal Nehru National Institute of Technology Allahabad, Prayagraj 211 004, India

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.4c05539

Reference44 articles.

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4. Performance and Stability of Low Temperature Transparent Thin-Film Transistors Using Amorphous Multicomponent Dielectrics

5. Effect of UV and visible light radiation on the electrical performances of transparent TFTs based on amorphous indium zinc oxide