Author:
Morshed Tanvir Hasan,Devireddy Siva Prasad,Çelik-Butler Zeynep,Shanware Ajit,Green Keith,Chambers J.J.,Visokay M.R.,Colombo Luigi
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference47 articles.
1. Semiconductor Industry Association (SIA). International technology roadmap for semiconductors (ITRS). , 2005 [updated 2006].
2. High-κ gate dielectrics: current status and materials properties considerations;Wilk;J Appl Phys,2001
3. Ma TP. High-k gate dielectrics for scaled CMOS technology. In: Proceedings of the 6th International Conference Solid-State Integrated-Circuit Technology, vol. 1, 2001. p. 297–302.
4. Ultrathin high-κ gate stacks for advanced CMOS devices;Gusev;IEDM Tech Dig,2001
5. High-κ/metal-gate stack and its MOSFET characteristics;Chau;IEEE Electron Dev Lett,2004
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