1. Source/Drain eSiGe Engineering for FinFET Technology;Peng;Semicond. Sci. Technol.,2017
2. Facet Evolution of Selectively Grown Epitaxial Si1-xGex Fin Layers in sub-100 nm Trench Arrays;Jang;J. Cryst. Growth,2020
3. Fronts Propagating with Curvature Dependent Speed;Osher;J. Comput. Phys.,1988
4. Level Set Methods and Fast Marching Methods: Evolving Interfaces in Computational Geometry, Fluid Mechanics, Computer Vision, and Materials Science;Sethian,1999
5. F. Rodrigues, L.F. Aguinsky, A. Toifl, A. Hössinger, J. Weinbub, Feature Scale Modeling of Fluorocarbon Plasma Etching for Via Structures including Faceting Phenomena, in: Book of Abstracts of the International Workshop on Computational Nanotechnology (IWCN), vol. 254, 2021, pp. 101–102.